| NAME |
TITLE |
PROGR. REF.
|
ABS. REF.
|
| |
|
|
|
|
Micro- and nano- Systems for Biology
|
| |
|
|
|
| Alicia Johansson |
Piezoresistive SU-8 cantilever floor for investigation of cell-substrate interactions and biomechanics |
P-BIO01
|
Agora
|
| Reo Kometani |
Methods to control microtubules' movementfor development of dynein-based bio nano-devices |
P-BIO02
|
Agora
|
| Cecile Crozatier |
Microfluidic modulus for convenient cell culture and screening experiments |
P-BIO03
|
|
| Janette Lilian Maria Schulze |
Micro SU-8 Chamber for Real-Time PCR of Salmonella spp. DNA |
P-BIO04
|
|
| Yong Chen |
Fast temperature control using an integrated cooling system for on-chip quantitative PCR. |
P-BIO05
|
|
| Tien-Li Chang |
Effect of Different Gold Nanoparticle Sizes to Build an Electrical Detection DNA between Nanogap Electrodes |
P-BIO06
|
Agora
|
| Daniel Ramos |
Optical actuation of microcantilevers in liquids |
P-BIO07
|
Agora
|
| Enric Claverol-Tinturé |
Star-shaped Polymer-on-Multielectrode (PoM) arrays for interfacing with neurons |
P-BIO08
|
|
| Dong-Woo Cho |
3D scaffold fabrication with PPF/DEF using micro-stereolithography |
P-BIO09
|
|
| Andreas Heeren |
Manipulation of Micro- and Nanoparticles by Electro-Osmosis and Dielectrophoresis |
P-BIO10
|
|
| Christophe PEROZ |
Laser-on-chip using second order distributed Bragg Reflectors fabricated by soft UV nanoimprint lihography |
P-BIO11
|
Agora
|
| Mike GENEVIÈVE |
Bio-functionalization of gold nano-particles and their spectral properties |
P-BIO12
|
Agora
|
| Ernest Mendoza |
Fabrication of Microelectrodes based on carbon nanotubes for biosensing applications |
P-BIO13
|
Agora
|
| Guillaume Mernier |
On-Chip in situ Release of Neurotransmitter for Neuronal Stimulation |
P-BIO14
|
Agora
|
| Dong-Weon Lee |
Fabrication and Evaluation of a novel protein sensor based on the Lorentz force |
P-BIO15
|
Agora
|
| jian shi |
Fabrication and Surface Functionalization of High Aspect Ratio Plastic Nanostructures |
P-BIO16
|
Port Vell
|
| Marco Matteucci |
Micro-mechanical stress for cancer metastasis studies |
P-BIO17
|
Port Vell
|
| Ana Ruiz |
Direct printing of proteins to fabricate nano/micro-engineered surfaces for cell culturing |
P-BIO18
|
Port Vell
|
| Marco Matteucci |
Micropatterned Dry Electrodes for Brain-Computer Interface |
P-BIO19
|
Port Vell
|
| Krzysztof Malecki |
Polymer-Glass Fluidic Microdevice for Single Cell Photodynamic Therapy Evaluation |
P-BIO20
|
Port Vell
|
| Duc Duong-Hong |
Dissipative Particle Dynamics for Simulating Nanofluidic Biomolecules Filters |
P-BIO21
|
Port Vell
|
| Ilona Grabowska |
Microfluidic system with electrochemical and optical detection |
P-BIO22
|
Port Vell
|
| Irina Kleps |
Development of the micro- and nanoelectrodes for cells investigation |
P-BIO23
|
Port Vell
|
| Johann Mertens |
PROFILING OF CANTILEVER ARRAYS FOR SENSING APPLICATIONS |
P-BIO24
|
Port Vell
|
| Petros Argyrakis |
Fabrication and characterization of a biomorphic wind sensor for integration with a neuron chip |
P-BIO25
|
Port Vell
|
| Chris Mills |
Micro- and Nanostructured Polymer Surfaces for Biomedical Applications |
P-BIO26
|
Port Vell
|
| Fu-Hsiang Ko |
Selective Bottom-up Assembly of Active Enzyme onto the Silicon-based Surfaces |
P-BIO27
|
Port Vell
|
| Marco Matteucci |
A Compact and Disposable Transdermal Drug Delivery System |
P-BIO28
|
Port Vell
|
| frederic Bretagnol |
Fabrication of nano patterned surfaces by electron beam lithography and plasma processes |
P-BIO29
|
Port Vell
|
| Rafal Wierzbicki |
Low-voltage driven electrostatic microgripper for biotechnology |
P-BIO30
|
Port Vell
|
| Jérome Chalmeau |
Elaboration of Micro-domains of supported bilayers using Microcontact printing |
P-BIO31
|
Port Vell
|
| Herbert Schuck |
Rapid prototyping of 3D micro- nanostructures to explore cell behaviour |
P-BIO32
|
Port Vell
|
| Yong Chen |
Microfluidic device for protein crystallization under controlled humidity |
P-BIO33
|
Port Vell
|
| Liviu Nicu |
Molecularly Imprinted Polymer-based immunoassay using resonant piezoelectric membranes with integrated actuation and detection scheme |
P-BIO34
|
Port Vell
|
| Dong-Woo Cho |
Development of bone scaffold using HA nano powder and MSTL technology |
P-BIO35
|
Port Vell
|
| Jongheop Yi |
In-situ observation of superoxide dismutase aggregates behaviour on the patterned surface via a scanning probe microscopy |
P-BIO36
|
Port Vell
|
| Ya-Wei Lee |
NARMAX Models for Droplet Behaviors in Microjet Experimental Study |
P-BIO37
|
Port Vell
|
| MAURICIO MORENO |
Optical sub-micron grating-waveguides for biosensor applications |
P-BIO38
|
Port Vell
|
| |
|
|
|
|
Process Diagnosys and Control
|
| |
|
|
|
| Neus Sabate |
FIB-based technique for the measurement of local residual stresses on thin films |
P-DIAG1
|
|
| Faisal Mohd-Yasin |
Low Frequency Noise Measurement and Analysis of Capacitive Micro-Accelerometers |
P-DIAG2
|
Agora
|
| Masashi Kuwahara |
Measurement of the thermal conductivity of nano-meter scale thin films by thermoreflectance phenomenon |
P-DIAG3
|
Agora
|
| Uwe Huebner |
A lateral nanoscale linewidth/pitch standard for every day calibration of high-resolution microscopy techniques |
P-DIAG4
|
|
| David Mendels |
Design and Modelling of a Load Cell for micro-Newton Force Measurement |
P-DIAG5
|
|
| Wen-Fa Wu |
Effect of capping layers on the electrical characteristics of nickel silicided junctions |
P-DIAG6
|
|
| Shaojun Fu |
Study on the Surface Roughness of Substrate with Multi-Fractal Spectrum |
P-DIAG7
|
Agora
|
| Marco Cucinelli |
Mask Aligner Lithography: Pushing the Limits |
P-DIAG8
|
Agora
|
| |
|
|
|
|
Electron and Ion Beam Lithography
|
| |
|
|
|
| Martijn Van Bruggen |
Electrostatic blanker array for the fabrication of sub-10 nm structures with multi-electron-beam induced deposition |
P-EIBL01
|
|
| Rafael Aldana |
Miniature traveling wave deflection for electron beam analog to digital conversion |
P-EIBL02
|
Agora
|
| Susanne Beuer |
Accurate parameter extraction for the simulation of direct structuring by ion beams |
P-EIBL03
|
Agora
|
| Peter Hudek |
Fogging Effect Correction Method in High-Resolution Electron Beam Lithography |
P-EIBL04
|
|
| Sergey zaitsev |
Dose deposited during e-beam exposure fluctuations simulation |
P-EIBL05
|
|
| Dong-Woo Cho |
Design & Measurement of Nano-patterns for FIB Reliability Assessment |
P-EIBL06
|
|
| A.E. GRIGORESCU |
Sub-10 nm linewidth in HSQ, using Electron Beam Lithography |
P-EIBL07
|
Agora
|
| Hisatake Sano |
Analysis of pattern-dependent image placement of single-membrane stencil masks for e-beam lithography |
P-EIBL08
|
Agora
|
| Eva Terrado |
Controlled growth of carbon nanotubes on sites predefined by focused ion beam lithography |
P-EIBL09
|
|
| Wuxia Li |
Fabrication of micro/nano-features in fused silica using focused-ion-beam |
P-EIBL10
|
Agora
|
| Stephen Gilmartin |
Nanoscale Device Fabrication using the 2-Step NERIME Nanolithography Process |
P-EIBL11
|
Agora
|
| Enikö Horváth |
Morphological and Electrical Study of FIB Deposited W Wires |
P-EIBL12
|
|
| Takayuki Yabe |
CD and IP accuracy in Electron Beam Character Projection technology |
P-EIBL13
|
|
| Guido Piaszenski |
Zero Stitching Error E-Beam Exposure for Next Generation Atom Chips |
P-EIBL14
|
|
| Ho Seob Kim |
Low Voltage Imaging Detection Methods for Microcolumn System |
P-EIBL15
|
Agora
|
| José I. Martín |
Large arrays of dots fabricated by Electron Beam Lithography |
P-EIBL16
|
Agora
|
| |
|
|
|
|
Maskless Lihtography / Mask Technology
|
| |
|
|
|
| Yong-Chae Chung |
Theoretical Investigation of Pattern Printability of Oxidized Si and Ru Capping Model for Extreme Ultraviolet Lithography (EUVL) |
P-ML/MK1
|
|
| Yijian Chen |
Wavefront Modulation to Suppress Image Blur for EUV Maskless Lithography |
P-ML/MK2
|
|
| Xiaowei Guo |
Surface-plasmon polariton interference nanolithography |
P-ML/MK3
|
Agora
|
| Dong-Weon Lee |
Micro/nanoheater-integrated cantilevers for micro/nano lithography applications |
P-ML/MK4
|
Agora
|
| |
|
|
|
|
Microsystems and their Fabrication
|
| |
|
|
|
| yong chen |
Hot strip devices for thermal characterisation of droplet size nanofluid samples |
P-MST01
|
|
| Daniela Andrijasevic |
Aspects of micro structuring Low Temperature Cofired Ceramic (LTCC) for realisation complex 3D objects by embossing |
P-MST02
|
Agora
|
| Alexander Doll |
CHARACTERIZATION OF ACTIVE SILICON MICROVALVES WITH PIEZOELECTRIC MEMBRANE ACTUATORS |
P-MST03
|
Agora
|
| Mark Rosamond |
Substrate independent fabrication of a non-planar probe card |
P-MST04
|
|
| Ioannis Raptis |
Fabrication of conductometric chemical sensors with a novel lithographic method |
P-MST05
|
|
| Takao Matsumoto |
A Microfabricated Boersch Phase Plate for Electron Microscopy |
P-MST06
|
|
| Maria Villarroya |
Fabrication of nano-gaps for MEMS prototyping using Focused Ion Beam as a lithographic tool and Reactive Ion etching pattern transfer |
P-MST07
|
Agora
|
| Belen Solano |
Design and testing of a Polymeric Microogripper for cell Manipulation |
P-MST08
|
Agora
|
| zhi ming Wang |
Microfluidic Cooling of Semiconductor Light Emission Diodes |
P-MST09
|
|
| Natallia Balabanava |
Effect of roughness on adhesion of polymeric coatings used for microgrippers |
P-MST10
|
Agora
|
| Stephan Keller |
Optimized dry-release and passivation of thin SU-8 cantilevers |
P-MST11
|
Agora
|
| Beom-Hoan O |
Fabrication of MMI Optical Power Splitter by UV Embossing with PDMS Mold |
P-MST12
|
|
| Francisco J. Blanco |
FLEXIBLE AND BIOCOMPATIBLE POLYMER MICROFLUIDIC DEVICES WITH INTEGRATED ELECTRODES BASED ON A CMOS COMPATIBLE TECHNOLOGY |
P-MST13
|
|
| Maria Nordström |
Novel fabrication technique for free-hanging polymeric structures |
P-MST14
|
|
| Timo Mappes |
X-Ray Lithography for Devices with High Aspect Ratio Polymer Submicron Structures |
P-MST15
|
Agora
|
| Walter Smetana |
A multi-sensor biological monitoring module built up in LTCC-technology |
P-MST16
|
Port Vell
|
| Andrei Lucian Boglea |
Advanced laser based tool for micro-assembly |
P-MST17
|
Port Vell
|
| keith houston |
Novel micro-gripper coatings to reduce forces of adhesion during micromanipulation: |
P-MST18
|
Port Vell
|
| Philipp Nellen |
Focused Ion Beam Modifications of Indium Phosphide Photonic Crystals |
P-MST19
|
Port Vell
|
| Roman Holly |
Fabrication of silicon 3D taper structures for optical fibre to chip interface |
P-MST20
|
Port Vell
|
| Ko Chu-Jung |
Manipulation of the phase separation of organic blends in sub-micron scale |
P-MST21
|
Port Vell
|
| Iwona Wyzkiewicz |
Novel photoimageable process for fabrication of microfluidic structures |
P-MST22
|
Port Vell
|
| Philip Prewett |
Micro-opto-electromechanical system for x-ray focusing |
P-MST23
|
Port Vell
|
| Marc Bendahan |
NEW ETHANOL SENSOR BASED ON ORGANIC SEMICONDUCTOR THIN FILM |
P-MST24
|
Port Vell
|
| xueyong wei |
Fabrication of Ni–Al2O3 Composite Microcomponent by Electroforming |
P-MST25
|
Port Vell
|
| Ivo W. Rangelow Ivo W. Rangelow |
Piezoresistive and Self-Actuated 128-Cantilever Arrays for Nanotechnological Aplication |
P-MST26
|
Port Vell
|
| Søren Dohn |
Cantilever readout by hard contact |
P-MST27
|
Port Vell
|
| adrien Plecis |
Fabrication of complex and robust microfluidic devices based on glass-PDMS-glass technology |
P-MST28
|
Port Vell
|
| Ramona Mateiu |
Reliability of Poly (3,4-Ethylenedioxithiophene) Strain Gauge |
P-MST29
|
Port Vell
|
| Milan Držík |
Thermomechanical response of membrane-like MEMS component |
P-MST30
|
Port Vell
|
| Rafal Wierzbicki |
Concepts of force-feedback systems for direct micromanipulation. |
P-MST31
|
Port Vell
|
| Humberto Campanella |
Process considerations in fabricating bulk acoustic wave resonators |
P-MST32
|
Port Vell
|
| Ioanna Giouroudi |
A Force Feedback System for Micromanipulation with Stereoscopic Imaging. |
P-MST33
|
Port Vell
|
| Dong-Weon Lee |
MEMS-based modular actuators for capsular endoscope applications |
P-MST34
|
Port Vell
|
| Harutaka Mekaru |
Development of ultrasonic micro hot embossing technology |
P-MST35
|
Port Vell
|
| Javier Rodriguez-Viejo |
High_Temperature Nancoalorimetry using membrane-based microreactors |
P-MST36
|
Port Vell
|
| Jose Antonio Plaza |
Novel cantilever design with high control of the mechanical performance |
P-MST37
|
Port Vell
|
| Angeliki Tserepi |
A novel process for irreversible bonding of PDMS and PMMA substrates |
P-MST38
|
Port Vell
|
| Elena Cianci |
Young's modulus and residual stress of DF PECVD silicon nitride for MEMS free standing membranes |
P-MST39
|
Port Vell
|
| Marc Bendahan |
WO3 SENSOR RESPONSE ACCORDING TO OPERATING TEMPERATURE: EXPERIMENT AND MODELLING |
P-MST40
|
Port Vell
|
| Fu-Hsiang Ko |
Fabrication of a Gas Sensor with a Piezoelectric PZT Film Deposited by a Novel Hydrothermal Microwave-Assisted Annealing |
P-MST41
|
Port Vell
|
| Luca Troisi |
High resolution pixel definition in hybrid microcavities. |
P-MST42
|
Port Vell
|
| Minqiang Bu |
Design and FEM Simulation of a Microfluidic Magnetic Beads Separator |
P-MST43
|
Port Vell
|
| Christophe Serre |
Optimization keys for vibrational electromagnetic generators |
P-MST44
|
Port Vell
|
| Javier Sesé |
Process development for the fabrication of Microsystems using zeolites |
P-MST45
|
Port Vell
|
| Ana Sancho |
3D macroporous structures for the development of high capacitance silicon integrated microcapacitors |
P-MST46
|
Port Vell
|
| Andrea Coppa |
Building the CMUT for imaging applications from top to bottom |
P-MST47
|
Port Vell
|
| B. S. Kang |
Fabrication and Characterization of a Pressure Sensor Using a Pitch-based Carbon Fiber |
P-MST48
|
Port Vell
|
| Marcin Juchniewicz |
Novel technology for stamp fabrication |
P-MST49
|
Port Vell
|
| Ioanna Giouroudi |
Test Device for Rotating Microsystems |
P-MST50
|
Port Vell
|
| Ilaria Ingrosso |
Fabrication of AlN/Si SAW delay lines with very low RF signal noise |
P-MST51
|
Port Vell
|
| Nadja Adamovic |
Development of UV-LIGA integrated vibrometer using 3x3 directional coupler |
P-MST52
|
Port Vell
|
| Fang-Chung Chen |
Fabrication of a microlens array using ink-jet printing on a pre-patterned substrate by self-assembled monolayers |
P-MST53
|
Port Vell
|
| Burkhard Volland |
Duo-action electrothermal microgripper |
P-MST54
|
Port Vell
|
| Stella Vallejos |
Micro-machined WO3-based sensors selective to oxidizing gases |
P-MST55
|
Port Vell
|
| Ken-ichiro Nakamatsu |
Structure analysis of wire rod of nanosprings fabricated by FIB-CVD |
P-MST56
|
Port Vell
|
| Holger Götze |
Development of a micromanipulator based on piezoelectric-technology |
P-MST57
|
Port Vell
|
| Christos Tsamis |
Pulsed mode operation of low power SnO2 sensors for improved gas selectivity |
P-MST58
|
Port Vell
|
| Carlos Molpecceres |
Advanced 3D micromachining techniques using UV laser sources |
P-MST59
|
Port Vell
|
| Pablo Luis Pernas |
Integrated electro-optic Mach-Zehnder modulator fabricated by vapour Zn-diffusion in LiNbO3 |
P-MST60
|
Port Vell
|
| |
|
|
|
|
Nanodevices
|
| |
|
|
|
| Florian Stade |
Fabrication of metalic nanostructures for investigating plasmon-induced field enhancement |
P-NDEV01
|
Agora
|
| Richard Langford |
Magnetoresistance and Spin Diffusion in Multi-Wall Carbon Nanotubes |
P-NDEV02
|
Agora
|
| Zsolt E. Horváth |
Carbon Nanotube Mat Chemical Sensors |
P-NDEV04
|
Agora
|
| Gemma Rius |
Response of carbon nanotube transistors to electron beam exposure |
P-NDEV05
|
Agora
|
| Zachary J. Davis |
Nano-mechanical resonators for mass sensing applications |
P-NDEV06
|
Agora
|
| Hong-Bay Chung |
Characteristic improvement of Ge1Se1Te2 phase change memory |
P-NDEV07
|
Agora
|
| Somsak Panyakeow |
Self-Assembled Quantum Dot Molecules for Practical Nanostructure Devices: Bottom-Up Approach |
P-NDEV08
|
Agora
|
| Seung-Beck Lee |
Fabrication of Flexible and Transparent Single Wall Carbon Nanotube Gas Sensors by Selective Vacuum Filteration and Poly(dimethyl siloxane) Mold Transfer |
P-NDEV09
|
Agora
|
| Lisa Creswell |
Microwave resonances in silicon-based single electron transistors |
P-NDEV10
|
Agora
|
| Montserrat Nafría |
Analysis of the degradation of Hf/SiO2 gate stacks using nanoscale and device level techniques. |
P-NDEV11
|
Agora
|
| Sangsig Kim |
A fabrication technique of top-gate nanowire FETs by a photolithography process |
P-NDEV12
|
Agora
|
| M.J. Chen |
Metal-Insulator-Semiconductor Light-Emitting Diodes with Utrathin Al2O3 Layer Grown by Atomic Layer Deposition on Silicon |
P-NDEV13
|
Agora
|
| Sangsig Kim |
Memory Characteristics of Al Nanocrystals Embedded in Al2O3 Layers |
P-NDEV14
|
Agora
|
| Hideo Sunami |
Plasma-Doping Induced Damages Associated with Source/Drain Formation in Beam-Channel MOS Transistor on 1-mm Thick SOI Substrate |
P-NDEV15
|
Agora
|
| Stephan Abermann |
Processing and evaluation of meal gate/high-k/Si capacitors |
P-NDEV16
|
Agora
|
| Yijian Chen |
Double Surrounding-Gate Control of Si Body in Vertical Integrated-Gate CMOS |
P-NDEV17
|
Agora
|
| Zoran Djuric |
Thermomechanical Noise of Nanooscillators with Time-Dependent Mass |
P-NDEV18
|
Agora
|
| Sangsig Kim |
Fabrication of Thin-film Transistors Based on CdTe/CdHgTe Nanocrystals |
P-NDEV19
|
Agora
|
| Ko Chu-Jung |
Microwave annealing processes in organic photovoltaic devices |
P-NDEV20
|
Agora
|
| Ming Liu |
Fabrication of SOI based nano-scale mechanical resonator coupled with a single electron transistor |
P-NDEV21
|
Agora
|
| Hong-Bay Chung |
Investigation of Resistance Change Characteristics with Applied Electric Field on Ag / Chalcogenide As2S3 and As40Ge10Se15S35 Thin Film Structure |
P-NDEV22
|
Agora
|
| Han-geon Kim |
2D Quanmtum Mechanical Device Modeling and Simulation: FinFET Having an Isolated n+/p+ Gate Region Strapped with Metal and Poly-silicon |
P-NDEV23
|
Agora
|
| JOSE MARIA DE TERESA |
Transport properties of Fe3O4 thin films for applications in Spin Electronics |
P-NDEV24
|
Agora
|
| Jose Calderon-Moreno |
Silver Nanoprism Coatings on Optical Glass Substrates. |
P-NDEV25
|
Agora
|
| |
|
|
|
|
Nanoimprint Lithography
|
| |
|
|
|
| Nicolas Chaix |
Nanoimprinting lithography on 200 mm wafers for optical applications |
P-NIL01
|
Agora
|
| Douglas Resnick |
Template Replication for Full Wafer Imprint Lithography |
P-NIL02
|
Agora
|
| Filip Crnogorac |
Nano-Graphoepitaxy of Semiconductors for 3D Integration |
P-NIL03
|
Agora
|
| Rasmus Haugstrup Pedersen |
Fabrication of Long-Range Surface Plasmon Polariton Devices by Nanoimprint Lithography |
P-NIL04
|
Agora
|
| Ki-don Kim |
Replication of UV-NIL Stamp Using Fluorine Doped DLC Coating |
P-NIL05
|
Agora
|
| Namil Koo |
Improved mold fabrication for the definition of high quality nanopattern by Soft UV Nanoimprint lithography using diluted PDMS material |
P-NIL06
|
Agora
|
| W. Lee |
Fabrication of wafer-scale Ni imprint stamps based on interference lithography and their applications for perfectly ordered anodic alumina membranes |
P-NIL07
|
Agora
|
| Yoshihiko Hirai |
Low cost and rapid reproduction of fine structures by nano casting lithography |
P-NIL08
|
Agora
|
| Jun Taniguchi |
Fabrication and resolution evaluation of three-dimensional nanoimprint mould using inorganic resist in low acceleration voltage electron beam lithograpy |
P-NIL09
|
Agora
|
| Pauline Voisin |
High-resolution fused silica mold fabrication for UV-Nanoimprint |
P-NIL10
|
Agora
|
| Masaaki Yasuda |
Analysis of yield stress of crystalline and amorphous Si mold in nanoimprint |
P-NIL11
|
Agora
|
| Nikolaos Kehagias |
Reverse UV Nanoimprint Lithography technique for 3D nanofabrication |
P-NIL12
|
Agora
|
| Michael Muehlberger |
A Moiré Method for High Accuracy Alignment in Nanoimprint Lithography |
P-NIL13
|
Agora
|
| Tanguy LEVEDER |
Resist viscosity measurement for accurate nano-imprint simulation |
P-NIL14
|
Agora
|
| Helmut Schift |
Fast heating and cooling in nanoimprint using an alignment fixture |
P-NIL15
|
Agora
|
| Michael Häffner |
Simple High Resolution Nanoimprint-Lithography |
P-NIL16
|
Port Vell
|
| Stefan Landis |
Investigation of capillary bridges growth in NIL process |
P-NIL17
|
Port Vell
|
| Guido Piaszenski |
3-D Structures for UV-NIL Template Fabrication with Greyscale E-Beam Lithography |
P-NIL18
|
Port Vell
|
| Sergey Zaitsev |
Design, fabrication and testing of rheological nano –indenter. |
P-NIL19
|
Port Vell
|
| Hella-Christin Scheer |
Fingerprint stamp for evaluation of polymer flow time constants in thermal nanoimprint |
P-NIL20
|
Port Vell
|
| Tanguy LEVEDER |
Post demolding pattern reflow in hot-embossing lithography |
P-NIL21
|
Port Vell
|
| Santos Merino |
The use of automatic demolding on Nanoimprint Lithography processes |
P-NIL22
|
Port Vell
|
| JaeJong Lee |
The UV-Nanoimprint Lithography Equipment with Multi-head Imprinting Unit for Sub-50nm Half-pitch Patterns |
P-NIL23
|
Port Vell
|
| Pauline Voisin |
High sensitive and etch-resistant material for UV-Nanoimprint |
P-NIL24
|
Port Vell
|
| Yasuhide Kawaguchi |
Fluorinated materials for UV Nanoimprint Lithography |
P-NIL25
|
Port Vell
|
| Seunghyun Ra |
Fine patterning of thermoset resins for PCB using thermal imprint technology |
P-NIL26
|
Port Vell
|
| Heon Lee |
Improving nickel stamp fabrication with hot embossing and electroforming |
P-NIL27
|
Port Vell
|
| Ken-ichiro Nakamatsu |
Fluorinated diamond-like carbon coating as an anti-sticking layer on a nanoimprint mold |
P-NIL28
|
Port Vell
|
| Thorsten Wahlbrink |
Dimensional stability in step & repeat UV-nanoimprint lithography |
P-NIL29
|
Port Vell
|
| Joachim Zajadacz |
Flexible fabrication of 3d structures with UV curable acrylates and cycloalipatic epoxides |
P-NIL30
|
Port Vell
|
| Marko Vogler |
Development of a novel, low-viscosity UV-curable polymer system for UV nanoimprint lithography |
P-NIL31
|
Port Vell
|
| Tony DiBiase |
Defect characterization of Nano Imprint templates including cleaning process and defect densities at both template and wafer levels |
P-NIL32
|
Port Vell
|
| Alexei L. Bogdanov |
Optimized Process for S-FIL Template Fabrication at sub-70 nm scale |
P-NIL33
|
Port Vell
|
| Beom-Hoan O |
Fabrication of a Polymeric Photonic Crystal Wavelength-splitter Using UV-embossing Technology |
P-NIL34
|
Port Vell
|
| Masaaki Kurihara |
3D structural templates for UV-NIL fabricated with gray-scale lithography |
P-NIL35
|
Port Vell
|
| Tomi Haatainen |
Stamp replication by Step&Stamp Imprint Lithography |
P-NIL36
|
Port Vell
|
| Heon Lee |
Thermal imprinting lithography process using sub-micron sized nickel template |
P-NIL37
|
Port Vell
|
| Saskia Möllenbeck |
Investigation of the separation of 3D-structures with undercuts |
P-NIL38
|
Port Vell
|
| |
|
|
|
|
Nanoscale Engineering and Fabrication
|
| |
|
|
|
| Wuxia Li |
Fabrication and characterisation of self-assembled nanomagnets by electrodeposition based on anodic aluminium oxide templates |
P-NSC01
|
Agora
|
| Ran Ji |
Kill two birds with one stone: Templated fabrication of nanowire and nanoring arrays based on interference lithography and electrochemical deposition |
P-NSC02
|
Agora
|
| Christoph Schoendorfer |
FIB induced growth of antimony nanowires |
P-NSC03
|
Agora
|
| Matthias Schramboeck |
In-based Quantum Dots on AlxGa1-xAs Surfaces |
P-NSC04
|
Agora
|
| E Kondoh |
Nanostructure Formation using Supercritical Carbon Dioxide Fluids |
P-NSC05
|
Agora
|
| Reo Kometani |
Nano-factory with the integrated manipulation system having the 3-D fingers fabricated by focused-ion-beam chemical-vapor-deposition |
P-NSC06
|
Agora
|
| Michael Zier |
Ultra-shallow pn-junction fabrication for piezoresistive AFM deflection sensors |
P-NSC07
|
Agora
|
| Fredrik Persson |
Investigation of fluid dynamics during capillary filling in high aspect ratio SiO2 nanochannels |
P-NSC08
|
Agora
|
| Christoph Deneke |
InGaAs/GaAs-alkanethiolate radial superlattices |
P-NSC09
|
Agora
|
| Bob van Someren |
Growth of a Carbon Nanotube on a Tungsten Tip using Electron Beam Induced Deposited Iron Catalyst |
P-NSC10
|
Agora
|
| Daryl Beggs |
Design and fabrication of high-efficiency fibre couplers for nanophotonic devices |
P-NSC11
|
Agora
|
| Massimo De Vittorio |
Fabrication of force sensors based on two-dimensional photonic crystal technology |
P-NSC12
|
Agora
|
| Seung-Beck Lee |
Template assisted electrostatic assembly of colloidal Au nanoparticles |
P-NSC13
|
Agora
|
| William Arora |
Membrane folding by ion implantation stress for 3-D nanomanufacturing |
P-NSC14
|
Agora
|
| Hsuen-Li Chen |
Fabrication of three-dimensional inverse-opal structures with tunable photonic bandgaps by utilizing polymer and silica hybrid colloids |
P-NSC15
|
Agora
|
| David Peyrade |
Real-time imaging of dielectrophoresis integration of gold colloids into NIL devices |
P-NSC16
|
Port Vell
|
| Lothar Bischoff |
Defect induced nanowire growth by FIB implantation |
P-NSC17
|
Port Vell
|
| Liam O'Faolain |
Shot-Shifting for Nanophotonic Applications |
P-NSC18
|
Port Vell
|
| Irene Fernández-Cuesta |
Fabrication of interdigitated nanoelectrodes by a combination of AFM local anodic oxidation and nanoimprint lithography |
P-NSC19
|
Port Vell
|
| Konstantins Jefimovs |
Fabrication of Fresnel zone plates for hard X-rays |
P-NSC20
|
Port Vell
|
| Minoru Obara |
Plasmonics mediated nanohole fabrication by femtosecond laser |
P-NSC21
|
Port Vell
|
| yong chen |
Assembling of Nanoparticles on Patterned Micro and Nano Surfaces |
P-NSC22
|
Port Vell
|
| Angeliki Tserepi |
Nanostructuring of PDMS surfaces: Dependence on casting solvents |
P-NSC23
|
Port Vell
|
| Masaaki Yasuda |
Beam Condition Dependence of Electron Irradiation Damages in Carbon Nanotubes |
P-NSC24
|
Port Vell
|
| Ran Ji |
Fabrication of wafer-scale arrays of silicon nanofins and silica nanochannels based on interference lithography and oxidation size-reduction strategy |
P-NSC25
|
Port Vell
|
| Annamaria Gerardino |
Fabrication and characterization of point defect photonic crystal nanocavities for |
P-NSC26
|
Port Vell
|
| Jean Lapointe |
Fabrication of devices based on site-selective growth of self-assembled InAs/InP quantum dots |
P-NSC27
|
Port Vell
|
| Y. F. Mei |
Semiconductor nanochannel networks by deterministic layer wrinkling |
P-NSC28
|
Port Vell
|
| Minoru Obara |
Nano-void array in dielectric materials by femtosecond laser |
P-NSC29
|
Port Vell
|
| Neal Meyer |
SEM Verification of nDSE (nano Displacement Sensing & Estimation) |
P-NSC30
|
Port Vell
|
| Klaus Kallis |
Lithography Independent High Accuracy Fabrication and Characterization of Next Generation Nano-MOS-Transistors with L=25 nm and W=75 nm |
P-NSC32
|
Port Vell
|
| Antonio Qualtieri |
Colloidal nanocrystal air bridge fabricated by direct lithography |
P-NSC33
|
Port Vell
|
| Hayato Sone |
Growth control of self-assembled ErSi2 nanowire on silicon surface |
P-NSC34
|
Port Vell
|
| Ryouki Watanabe |
Atomic structure analysis of self-assembled ErSi2 nanowires formed on Si substrates |
P-NSC35
|
Port Vell
|
| Yifang Chen |
Fabrication of ferromagnetic nanoconstrictions by electron beam lithography using LOR/PMMA bilayer technique |
P-NSC36
|
Port Vell
|
| Moonsuk Yi |
Enhanced Performance of OTFT by Ar ion treatment onto gate dielectric |
P-NSC37
|
Port Vell
|
| Jun-ichi Fujita |
Graphitic Tube Transformation of FIB-CVD Pillar by Joule Heating with Flash Discharge |
P-NSC38
|
Port Vell
|
| In-Sung Park |
Nanoscale patterning using photo-assisted polymer transfer lithography |
P-NSC39
|
Port Vell
|
| Alexander Prinz |
Fabrication of GaAs/InGaAs nanoshells using AFM lithograpy. |
P-NSC40
|
Port Vell
|
| Muhammad Rafiq |
Fabrication of vertical nanopillar devices |
P-NSC41
|
Port Vell
|
| John Dyreby |
Simulating Fluid Flow and Capillary Interactions in Lithographically Directed, Evaporation Driven Self-Assemby Systems |
P-NSC42
|
Port Vell
|
| Sachin Sonkusale |
Uniformity analysis of array of sub-25 nm linewidth structures and Palladium nanowires obtain by PEDAL process |
P-NSC43
|
Port Vell
|
| Christos Christides |
Effect of magnetic-field on metal-insulator transitions in Bi wire structures |
P-NSC44
|
Port Vell
|
| Dong Sung Kim |
Fabrication of microchannel with nanopillar array using micromachined AAO |
P-NSC45
|
Port Vell
|
| Jongheop Yi |
Fabrication of mesa-type electrodes via AFM oxidation for Pt ion detection |
P-NSC46
|
Port Vell
|
| Akinori Ozasa |
Annealing Effect of Electronic Properties for Wires Fabricated by FIB and EB-CVD |
P-NSC47
|
Port Vell
|
| Filippo Romanato |
Fabrication by X-ray Lithography and Electrodeposition of 2D and 3D CdSe Photonic Crystal |
P-NSC48
|
Port Vell
|
| Thanassis Speliotis |
Exchange Bias in Ferromagnetic – Antiferromagnetic submicron structures |
P-NSC49
|
Port Vell
|
| Hans Mulders |
Measurements and calculations of FIB milling yield of bulk metals |
P-NSC50
|
Port Vell
|
| Kwan-Sun Yoon |
First-principles Investigation with the Classical Rate Theory on Prefactor of Indium in Silicon |
P-NSC51
|
Port Vell
|
| Bo Cui |
Fabrication of nanoring array by nanoimprint lithography and reactive ion etching |
P-NSC52
|
Port Vell
|
| Somchai Ratanathammaphan |
In-droplet-induced formation of InP nanostructures by solid-source molecular-beam epitaxy |
P-NSC53
|
Port Vell
|
| Valentinas Snitka |
Functionalized porphyrin nanotubes produced by ionic self-assembly |
P-NSC54
|
Port Vell
|
| Heon Lee |
Selective deposition of the silver nano particles using patterned the hydrophobic Self-Assembled Monolayer patterns and zero-residual Nano imprint Lithography |
P-NSC55
|
Port Vell
|
| Giovanni Pennelli |
Advantages of an almost triangular cross section for silicon nanostructure fabrication on SOI substrates |
P-NSC56
|
Port Vell
|
| Joong-Sik Kim |
Atomistic Modeing for Understanding the Suppression of Boron Diffusion in Ge Pre-amorphized Silicon Substrate |
P-NSC57
|
Port Vell
|
| Cho Cho Thet Cho Cho Thet |
Growth of Long-Range, Ordered InAs Quantum Dots on InGaAs/GaAs Cross-Hatch Virtual Substrate |
P-NSC58
|
Port Vell
|
| Neal Meyer |
Three Beam Nanoscale Prototyping for Photonics |
P-NSC59
|
Port Vell
|
| Changzhi Gu |
A Flexible Method for Fabricating Ion-beam Sculpting Nanopore |
P-NSC60
|
Port Vell
|
| |
|
|
|
|
Pattern Transfer
|
| |
|
|
|
| Jose Antonio Plaza |
DRIE based novel technique for AFM probes fabrication |
P-PAT1
|
Agora
|
| Magnus Lindblom |
SU-8 mold for high-aspect-ratio nickel zone plates |
P-PAT2
|
Agora
|
| Hiroaki Kawata |
Fabrication of Si mold with smooth side wall by new plasma etching process |
P-PAT3
|
Agora
|
| Maryna Lishchynska |
Modelling pattern transfer in stencil lithography |
P-PAT4
|
Agora
|
| Chan Woo Park |
Reverse nanostencil lithography using dual pattern transfer |
P-PAT5
|
Agora
|
| Zheng Cui |
Fabrication of Meta-materials by Lift-off Using PMMA/Al Stack |
P-PAT6
|
Agora
|
| Dimitris Davazoglou |
Copper metallization based on direct liquid injection hot-wire CVD |
P-PAT7
|
Agora
|
| Eugenio Sillero |
Selective etching of AlInN/GaN heterostructures for MEMS technology |
P-PAT8
|
Agora
|
| |
|
|
|
|
Photon Lithography
|
| |
|
|
|
| Roxann Engelstad |
Assessing Particle-Induced Distortions during Wafer Chucking |
P-PHO01
|
Agora
|
| Jonathan Jeauneau |
Materials and Performance of Multi-layer Lithography Schemes |
P-PHO02
|
Agora
|
| Chun-Hung Lin |
Influence of mask magnification factor on the diffracted light in extreme ultraviolet lithography |
P-PHO03
|
Agora
|
| Fu-Der Lai |
The 32, 45 and 65 nm-technology-node ArF-line high transmittance attenuated phase shift mask blank using monolayer amorphous Al2O3-TiO2 composite films |
P-PHO04
|
Agora
|
| Mario Marconi |
Development of a table top Nanopatterning tool with Extreme Ultraviolet laser illumination |
P-PHO05
|
Agora
|
| Jianliang Li |
Improvement of Model Kernel Representation in Process Simulation by Taking Pattern Correlation into account |
P-PHO06
|
Agora
|
| Philip Prewett |
Embedded Metal Mask Enhanced Evanescent Near Field Optical Lithography |
P-PHO07
|
Agora
|
| Balint Meliorisz |
Simulation of proximity and contact lithography |
P-PHO08
|
Agora
|
| Gerhard Kalkowski |
Flatness Characterisation Techniques for EUV Mask Chucks |
P-PHO09
|
Agora
|
| amandine borjon |
Analysis of the diffraction patterns for optimal Assist Feature placement. |
P-PHO10
|
Agora
|
| Arjan Verhappen |
Polarized Illuminator Impact on Line Edge Roughness |
P-PHO11
|
Agora
|
| Hsuen-Li Chen |
Fabrication of sub-wavelength antireflective structures in solar cells by utilizing modified illumination and defocus techniques in optical lithography |
P-PHO12
|
Agora
|
| Sungsoo Suh |
Binary mask side lobe suppression using space scattering bar |
P-PHO13
|
Agora
|
| Dryver Huston |
Debris Mitigation Strategies for Laser Copper Plasma X-ray Sources |
P-PHO14
|
Agora
|
| Atsunobu Une |
Nano Contact with a Vacuum Pin Chuck around the Periphery of a Wafer |
P-PHO15
|
Agora
|
| Sang-Kon Kim |
Thermal Mechanism for Optical Proximity Correction |
P-PHO16
|
Agora
|
| Christian Gardin |
Etch modelling for MB-OPC for 65nm node |
P-PHO17
|
Agora
|
| |
|
|
|
|
Resist and Resist Processing
|
| |
|
|
|
| George Patsis |
Stochastic simulation studies of molecular resists |
P-RES01
|
Agora
|
| Alex Robinson |
Suppression of Pinhole Defects in Fullerene Molecular Electron Beam Resists |
P-RES02
|
Agora
|
| Jun Taniguchi |
Improving sensitivity and resolution in inorganic positive EB resist |
P-RES03
|
Agora
|
| Anja Voigt |
Improved properties of hybrid epoxy nanocomposites for specific applications in the field of MEMS/ NEMS |
P-RES04
|
Agora
|
| Sergey Zaitsev |
Fast electron resist contrast definition by “fitting before measurement” approach. |
P-RES05
|
Agora
|
| Daiju Shiono |
LER evaluation of molecular resist for EUV lithography |
P-RES06
|
Agora
|
| Maria Chiara Ubaldi |
Molecular roughness analysis of developed resist by LER method |
P-RES07
|
Agora
|
| Beom-Hoan O |
Fabrication of Vertical Optical Interconnecting Structure using Photoresist Reflowed Mold Structures |
P-RES08
|
Agora
|
| Juan Schneider |
Linear Coating for Monolayer and Ultra Thin Film Production |
P-RES09
|
Agora
|
| Cristina Martin |
Electron beam lithography at 10 keV using an epoxy based high resolution negative resist |
P-RES10
|
Agora
|
| Tang Xionggui |
Simulation and analysis for microstructure profile of optical lithography based on SU-8 thick resist |
P-RES11
|
Agora
|
| Katerina Tsougeni |
Photosensitive PDMS materials for Optical Lithography |
P-RES12
|
Agora
|
| Haifang Yang |
Comparative Study of E-beam Resist Processes at Different Development Temperatures |
P-RES13
|
Agora
|
| Svetlana Bystrova |
Study of crack formation in high-aspect ratio SU-8 structures on silicon |
P-RES14
|
Agora
|
| Abellán Marián |
EBL Bi-layer resist scheme for CdTe submicron structures for lift-off proccesing |
P-RES15
|
Agora
|
| |
|
|
|
|
RF-MEMS, NEMS
|
| |
|
|
|
| Alvaro San Paulo |
Acoustic wave field imaging by atomic force microscopy in RF MEMS resonators: New methods and applications |
P-RF01
|
Port Vell
|
| Carlos Calaza |
Electromechanical Characterization of low actuation voltage RFMEMS capacitive switches based on DC CV measurements |
P-RF02
|
Port Vell
|
| Kazuaki Tanaka |
Parasitic Effect on MEMS Resonator Model Parameters |
P-RF03
|
Port Vell
|
| Irina Khmyrova |
Equivalent circuit modeling of resonant cantilever-floating gate HEMT |
P-RF04
|
Port Vell
|
| Alexander MEHDAOUI |
Vertical co-integration of AlSi MEMS tunable capacitors and Cu inductors for tunable LC blocks |
P-RF05
|
Port Vell
|
| arantxa uranga |
Electrical detection of multiple resonant modes in a CMOS-MEMS cantilever |
P-RF06
|
Port Vell
|
| Francesc Torres |
Bulk Acoustic Mode RF-MEMS Resonator Made From EBL and RIE Techniques |
P-RF07
|
Port Vell
|
| Fu-Der Lai |
The GHz surface acoustic wave filters fabricated by using an alternating phase-shifting mask design method and a mold with 5mm linewidth patterns |
P-RF08
|
Port Vell
|
| Francesc Torres |
Nanometer Scale Gaps for Capacitive Transduction Improvement on RF-MEMS Resonators |
P-RF09
|
Port Vell
|
| ILKWON OH |
Resonant Frequency and Instability of Multi-layered Micro-Resonators with Initial Imperfection Subject to Piezoelectric Loads |
P-RF10
|
Port Vell
|
| Jon Ander Etxeberria Intxausti |
Tunable MEMS Volume Capacitors for High Voltage applications |
P-RF11
|
Port Vell
|
| Sofiane Soulimane |
Planarization of photoresist sacrificial layer for MEMS fabrication |
P-RF12
|
Port Vell
|
| Elena Cianci |
Fabrication of RF MEMS switches on alumina wafers using PECVD a-Si as sacrificial layer |
P-RF13
|
Port Vell
|
