Last Updated: 14 September, 2006


The program is a combination of plenary, parallel and poster sessions.

The general structure of the MNE 2006 program will be as follows: the conference will begin with the welcome reception and the opening of the commercial exhibition Sunday 17 of September. The technical program will begin Monday 18 and will finalize Wednesday 20 in the evening. The posters’ session has a dedicated session Monday in the evening. The posters will remain exposed the three days of the conference.

Programme Guide (pdf)

Conference Overview (pdf)

More Detailed Overview (pdf)
Plenary Session Monday Parallel
Session
Tuesday Paralle
Session
Wednesday Parallel
Session
Posters

MNE 2006 Programme Overview

Sunday, September 17th  
       
17:00-20:00
Registration opens      
Commercial Exhibition

Agora Room
19:00-20:00
Welcome Reception
Agora Room + Port Vell Rooms


Monday, September 18th  
       
08:00
Registration opens  
08:30-09:30
Opening Address
Auditorium
Commercial Exhibition

Agora Room
09:30-11:00
Plenary Session
PL-1 (Auditorium)
11:00-11:30
Coffee Break
Agora Room +  Port Vell Rooms
11:30-13:00
Parallel Session
1B Nanodevices 1
CIC 1 Room
13:00-15:00
Lunch
Mediterranean and Europa World Rooms
15:00-17:00
Parallel Session
17:00-19:00
Poster Session


Tuesday, September 19th  
       
09:00-10:30
Plenary Session
PL-2 (Auditorium)
Commercial Exhibition

Agora Room
10:30-11:00
Coffee Break
Agora Room +  Port Vell Rooms
11:00-13:00
Parallel Session
3A MEMS/NEMS
Auditorium
3C Resists
A2 + A3 Room
13:10-15:00
Lunch
Mediterranean and Europa World Rooms
15:00-15:45
Plenary Session
PL-3 (Auditorium)
15:45-17:05
Parallel Session
4C Pattern Transfer
A2 + A3 Room
17:05-17:30
Coffee Break
Agora Room +  Port Vell Rooms
17:30-19:00
Parallel Session
5C Microsystems 2
A2 + A3 Room
   
20:00-23:00
Conference Dinner To be announced


Wednesday, September 20th  
       
09:00-10:30
Plenary Session
PL-4 (Auditorium)
Commercial Exhibition

Agora Room
10:30-11:00
Coffee Break
Agora Room +  Port Vell Rooms
11:00-13:00
Parallel Session
13:10-15:00
Lunch
Mediterranean and Europa World Rooms
15:00-17:00
Parallel Session
7B Nanodevices 2
CIC 1 Room
17:15-17:30
Conference Closing
Auditorium


MNE 2006 Plenary Sessions
     
Monday, September 18th  
Session PL 1
Auditorium
09:30-10:15 M. Sasago Where are the limitations of 193 nm immersion lithography?
PL1-1
10:15-11:00 L. Samuelson Novel applications based on nanowires
PL1-2
Tuesday, September 19th  
Session PL 2
Auditorium
09:00-09:45 H. Craighead Nanostructures for biomolecular analysis
PL2-1
09:45-10:30 C. T.-C. Nguyen  Towards LSI vibrating micromechanical signal processors
PL2-2
       
Session PL 3    
Auditorium
15:00-15:45 S. Williams Computing at the nanoscale
PL3-1
Wednesday, September 20th
Session PL 4
Auditorium
09:00-09:45 J. Bokkor Emerging Nanoelectronics in Mainstream Information Processing Systems
PL4-1
09:45-10:30 P. Kruit The role of MEMS in maskless lithography
PL4-2


MNE 2006 Parallel Sessions

Monday, September 18th      
         
Session 1A   Microsystems and their fabrication 1    
Auditorium   Chair: Juergen Brugger, Stella W. Pang    
11:30-12:00 A. Boisen Cantilever based sensors 1A-1 INVITED
12:00-12:20 Flavio Pardo Flexible fabrication of large pixel count piston-tip-tilt mirror arrays for fast Spatial Light Modulators. 1A-2  
12:20-12:40 Edouard Duriau Fabrication of Cantilevers and Double AFM Tips for the NanoProfiler 1A-3  
12:40-13:00 Manuel Aschwanden Tunable diffraction grating based on electroactive polymers 1A-4  
Session 1B   Nanodevices 1    
CIC1 Room   Chair: John R.A Cleaver, Michael Stuke     
11:30-11:50 Tatiana Borzenko Micro-patterned RTDs: fabrication details and device performance 1B-1  
11:50-12:10 Vito Errico Quantum Dot Nano-Cavity Emission Tuned by a Circular Photonic Crystal Lattice 1B-2  
12:10-12:30 Vincent Reboud Spontaneous emission of nanocrystals in nanoimprinted photonic structures 1B-3  
12:30-12:50 Laura Heyderman Permalloy thin films exchange-coupled to arrays of stencelled cobalt islands 1B-4  
         
Session 1C   Process Diagnostics and Control    
A2+A3 Room   Chairs: Albert Cornet, Steven Steen    
11:30-11:50 Atsuko Yamaguchi Single-shot Method for Bias-free LER/LWR Evaluation with Little Damage 1C-1  
11:50-12:10 Dominik Ziegler AFM Topography with Online Surface Potential Compensation 1C-2  
12:10-12:40 A. Walton Test structures for characterising microelectronic and MEMS related processes 1C-3 INVITED
12:40-13:00 Nicola Naujoks Measuring electrical sample properties by multifrequency AFM 1C-4  
Session 2A   Nanoscale Engineering and Fabrication 1    
Auditorium   Chair: Jacques Gierak, José I. Martín     
15:00-15:30 Ran Ji All roads lead to Rome: Two methods for the fabrication of perfectly ordered circular or elliptical nanoring arrays based on interference lithography 2A-1  
15:30-15:50 Dawn Bonnell Ferroelectric Nanolithography: Assembling Multi Component Nanostructures into Functional Devices 2A-2  
15:50-16:10 Morten Gersborg-Hansen Polymer-based nano-fluidic dye laser 2A-3  
16:10-16:30 Thomas Sünner Fine-tuning of GaAs photonic crystal cavities by digital etching 2A-4  
16:30-16:50 Cristian Giordano Nanocrystals cylindrical microcavities exploiting thin-walled InGaAs/GaAs microtubes 2A-5  
16:50-17:10 A. Fujimoto Nano-structured surface fabrication for higher luminiscent LED by self-assembled block copolymer 2A-6 INVITED
17:10-17:30 Steven Steen Wafer Scale 3D Integration: Overlay as the key to drive potential 2A-7  
Session 2B   Micro- and Nano-systems for Biology 1    
CIC1 Room   Chairs: Yong Chen, César Fernández    
15:00-15:30 A. Offenhaeuser DNA, proteins, and neurons coupled to electronic devices 2B-1 INVITED
15:30-15:50 Ulrike Lehmann On-chip antibody handling and detection in a magnetic droplet manipulation system 2B-2  
15:50-16:10 Daisuke Saya Collective fabrication of in-plane silicon nanotip for parallel femtoliter droplet deposition 2B-3  
16:10-16:30 Alicia Johansson Surface stress measurement in liquid using SU-8 cantilevers with integrated readout 2B-4  
16:30-16:50 Fu-Hsiang Ko Self-Aligned Gold-Silicide Nanowires for Protein Sensing 2B-5  
16:50-17:10 Jérôme Polesel Maris Piezoresistive Cantilever Array for Applications in Life Sciences 2B-6  
Session 2C   Photon Lithography    
A2+A3 Room   Chairs: Frank Michael Kamm    
15:00-15:20 Takako Yamaguchi Fabrication of hp 32 nm Resist Patterns using Near-field Lithography 2C-1  
15:20-15:40 Andy Ma Progress Towards Defect-free Masks for Extreme Ultraviolet Lithography 2C-2  
15:40-16:00 Artak Isoyan EUV Holographic Lithography: First Results 2C-3  
16:00-16:20 Abani Biswas A 45 Degree Dual Dipole Decomposition Scheme to Improve Image Fidelity 2C-4  
16:20-16:40 Yasin Ekinci 20 nm Line/Space Patterns in HSQ Fabricated by EUV Interference Lithography 2C-5  
16:40-17:00 Yasuhisa Inao Near-Field Lithography as prototype nano-fabrication tool 2C-6  


Tuesday, September 19th      
         
Session 3A   RF-MEMS. NEMS    
Auditorium   Chairs: Nuria Barniol, Rainer Minixhofer    
11:00-11:30 M. Tanaka Important features of MEMS devices for practical applications 3A-1 INVITED
11:30-11:50 Stella Chang Fabrication of a Tunable RF MEMS Inductor on Silicon in a sub-150°C Process 3A-2  
11:50-12:10 Kiyotaka YAMASHITA Some dependencies of field-emission current for RF-MEMS applications 3A-3  
12:10-12:30 Jordi Teva Fabrication of monolithic CMOS-MEMS devices using a standard 0.35um commercial technology for sensor and RF applications 3A-4  
12:30-12:50 Alvaro San Paulo Si nanowire NEMS: Fabrication and mechanical characterization of suspended single nanowire and nanowire array structures 3A-5  
12:50-13:10 Lauge Gammelgaard Wafer Scale Fabrication of Suspended TiW Nanowires 3A-6  
Session 3B   Electron and Ion Beam Lithography 1    
CIC1 Room   Chairs: Wilhelm H. Bruenger, Alexei Bogdanov     
11:00-11:30 E. Kolodney C60-ion source: novel surface processes and interactions 3B-1 INVITED
11:30-11:50 Peter Hahmann Resolution Enhancement for Variable-Shaped Beam Writers 3B-2  
11:50-12:20 O. Wilhelmi Nanofabrication and rapid prototyping with DualBeam instruments 3B-3 INVITED
12:20-12:40 Jacques Gierak Sub-5 nm FIB direct patterning of nanopores 3B-4  
12:40-13:00 Richard Langford Reducing the Resistivity of Electron and Ion  Beam Assisted Deposited Platinum 3B-5  
Session 3C   Resists and Resist Processing    
A2+A3 Room   Chair: Emile van der Drift, Alex Robinson    
11:00-11:20 Thorsten Wahlbrink Fabrication of high aspect-ratio HSQ nano-structures through supercritical drying 3C-1  
11:20-11:40 Vahid Fakhfouri High-aspect ratio three-dimensional photoresin-based microstructures doped with luminescent nanocrystals 3C-2  
11:40-12:00 Hiroaki Oizumi Patterning capability of new molecular resist in EUV lithography 3C-3  
12:00-12:20 Gaugiran Stephanie Leaching mechanisms in immersion lithography with and without top-coat 3C-4  
12:20-12:40 Morten Gersborg-Hansen Combined electron beam lithography and UV lithography in SU-8 3C-5  
12:40-13:10 M. Vogler Taylor-made polymers and resists - a key to the implementation of nanoimprint lithography 3C-6 INVITED
Session 4A   Micro- and Nano-systems for Biology 2    
Auditorium   Chairs: Evangelo Gogolides, Alejandro Pérez-Rodríguez    
15:45-16:05 yan jun liu Integrated Magnetic Micro-Columns for Cancer Cell Capture and Sorting 4A-1  
16:05-16:25 James Muys Bioimprint: Cellular Replication for Nanoscale Imaging 4A-2  
16:25-16:45 Yong Chen Patterning of hydrophilic micro arrays with super-hydrophobic surrounding zones 4A-3  
16:45-17:05 Pinelopi Bayiati Biofluid transport on hydrophobic plasma deposited fluorocarbon films 4A-4  
Session 4B   Nanoimprint Lithography 1    
CIC1 Room   Chairs:Hella C. Scheer, Helmut Schift    
15:45-16:05 Santos Merino A new way of manufacturing high resolution optical encoders by nanoimprint lithography 4B-1  
16:05-16:25 Douglas Resnick Step and Flash Imprint Lithography Templates for the 32 nm Node and Beyond 4B-2  
16:25-16:45 Nicolas Bogdanski Structure size dependent recovery of thin polystyrene layersin thermal imprint lithography 4B-3  
16:45-17:05 Stijn Scheerlinck UV-NIL with a DUV-Fabricated Silicon Template as a Flexible Tool for Nanopatterning 4B-4  
         
Session 4C   Pattern Transfer    
A2+A3 Room   Chairs: Fu-Hsiang Ko, Philippe Godignon    
15:45-16:05 Thomas TILLOCHER Silicon cryo-etching of deep holes 4C-1  
16:05-16:25 Xu Li Dry etching of a device quality high-k GaxGdyOz gate oxide in CH4/H2-O2 chemistry for the fabrication of III-V MOSFETs 4C-2  
16:25-16:45 Remi DUSSART The passivation layer formation in the cryo-etching plasma process 4C-3  
16:45-17:05 Georgios Boulousis Mechanism of surface roughness formation and evolution during Si etching 4C-4  
Session 5A   Nanoscale Engineering and Fabrication 2    
Auditorium   Chair: Andris Šternberg, Gottfried Strasser    
17:30-17:50 Charan Srinivasan Fabrication of Nanostructures using Molecular Ruler Resist 5A-1  
17:50-18:10 Kohichi Tanaka Detection of magnetic field for measuring current distribution in poly-Si layer 5A-2  
18:10-18:30 Vinzenz Friedli Mass sensor with femtogram resolution for in-situ control of focused electron beam induced deposition 5A-3  
18:30-18:50 Maria Villarroya Dynamics of attoliter glycerine drops evaporation using a CMOS-MEMS mass sensor 5A-4  
Session 5B   Micro- and Nano-systems for Biology 3    
CIC1 Room   Chair: Andreas Stemmer, Laura Lechuga     
17:30-18:00 U. Staufer Micro- and Nanosystems for Biology and Medicine 5B-1 INVITED
18:00-18:20 Makoto Fujimaki Nanoscale pore fabrication for high sensitivity waveguide-mode biosensors 5B-2  
18:20-18:40 Troels Balmer Christensen Sample preparation by cell guiding using negative dielectrophoresis 5B-3  
18:40-19:00 Michal Pribyl Quantification of human IgG in a multichannel microfluidic chip 5B-4  
Session 5C   Microsystems and their Fabrication 2    
A2+A3 Room   Chair: Rebecca Cheung, Philipp M Nellen    
17:30-17:50 Anthony Nichol Two-Step Magnetic Self-Alignment of Folded Membranes for 3D Nanomanufacturing 5C-1  
17:50-18:10 Christian David Fabrication of diffraction gratings for hard x-ray phase contrast imaging 5C-2  
18:10-18:30 C. Cané Micro and Nanotechnologies for Food Safety and Quality Applications 5C-3 INVITED
18:30-19:00 Aitor Ezkerra Fabrication of SU8 free standing structures embedded in microchannels for microfluidic control 5C-4  


Wednesday, September 20th      
         
Session 6A   Nanoscale Engineering and Fabrication 3    
Auditorium   Chair: Laura Heyderman, Vincent Derycke     
11:00-11:20 Christophe Yamahata Towards wet anisotropic silicon etching of perfect pyramidal pits 6A-1  
11:20-11:40 Livia Seemann Nano-Xerography applied to nanoparticles and carbon nanotubes 6A-2  
11:40-12:00 Rudeesun Songmuang From rolled-up of Si microtubes to SiOx/Si optical ring resonators 6A-3  
12:00-12:20 Markus Fischer Electron beam-induced direct-deposition of magnetic nanostructures 6A-4  
12:20-12:40 James Liddle Control of Lamellar Diblock Coploymers Through Patterned Surface Chemistry 6A-5  
12:40-13:00 Ramona Mateiu Batch fabrication of nanotubes suspended between microelectrodes 6A-6  
Session 6B   Nanoimprint Lithography 2    
CIC1 Room   Chairs: Santos Merino, Douglas Resnick    
11:00-11:30 L. Montelius Nanoimprint lithography for nanomechanics, electronics and life science applications 6B-1 INVITED
11:30-11:50 Yong Chen Micro-aspiration assisted lithography 6B-2  
11:50-12:10 Sergey Zaitsev Coarse-grain method for modelling of stamp deformation in nanoimprint 6B-3  
12:10-12:30 Yifang Chen High density pattern fabricated in SU-8 by Nanoimprint and UV curing 6B-4  
12:30-12:50 Tapio Mäkelä Roll to roll nanoimprinting on inherently conducting polyaniline 6B-5  
12:50-13:10 Javier G. Fernandez Forced Soft Lithography (FSL) and its Application to the Fabrication of Structured Chitosan Biopolymer for Cell-Surface Interaction Experiments 6B-6  
         
Session 6C   Maskless Lithography/Mask Technology    
A2+A3 Room   Chair: Serge Tedesco, Hiroyuki Ito    
11:00-11:20 Jingquan Lin Actinic EUVL Mask Blank defects inspection by EUV photoemission electron microscope 6C-1  
11:20-11:40 Hiroo Kinoshita Observation of the internal defects of multilayer films 6C-2  
11:40-12:10 J. Brugger Nanostencil lithography 6C-3 INVITED
12:10-12:30 Kun Liu Electron beam nanofabrication beyond 65nm node for mask repair and circuit edit 6C-4  
12:30-12:50 Frank Thrum CD control of direct versus complementary exposure for shaped beam writers and its correlation to the registration error 6C-5  
12:50-13:10 Jan Pieter Kuijten Process Impact from Mask Grid Variation 6C-6  
Session 7A   Microsystems and their fabrication 3    
Auditorium   Chair: Regina Luttge, Zachary Davis    
15:00-15:20 Thomas Hantschel Conductive diamond probes with electroplated holder chips 7A-1  
15:20-15:40 Yong Chen Characterization of Microfluidic Fuel Cell Based on Multiple Laminar Flow 7A-2  
15:40-16:00 Daniel Witte Lamellar Crystallization of Silicon for 3-dimensional Integration 7A-3  
16:00-16:20 Anders Greve Towards on-chip explosive detection using silicon cantilevers 7A-4  
16:20-16:40 ling Wang Micro-Nozzle Fabrication and Assembly for Nano-Emitter Electrospray 7A-5  
16:40-17:00 Stefano Sardo Fabrication of Apodized Bragg Gratings Structure for Tunable Filter 7A-6  
Session 7B   Nanodevices 2    
CIC1 Room   Chair: Jose Maria De Teresa, Adrian Bachtold    
15:00-15:30 Robert Hartman Future of nanoelectronics in Europe 7B-1  
15:30-15:50 Vincent Derycke Carbon nanotubes self-assembly for electronic applications 7B-2  
15:50-16:10 Tarek Lutz Fabrication of a Nano-Scale NAND memory array based on a SONOS Fin-FET cell using e-beam lithography and Hydrogen-Silsesquioxane resist 7B-3  
16:10-16:30 Filippo Romanato Desing and development of hybrid sol-gel films for direct patterning. 7B-4  
16:30-16:50 Antonio Qualtieri Photonic crystal based organic random lasers 7B-5  
16:50-17:10 Giuseppe Maruccio Negative differential resistance and electron pathway in molecular tunnel-junction based on individual Azurins 7B-6  
Session 7C   Electron and Ion Beam Lithography 2    
A2+A3 Room   Chair: Ivan Kostic, Sergey Zaitsev    
15:00-15:30 A. Romano Focused ion beam (FIB): a prototyping tool for micro and nanofabrication 7C-1 INVITED
15:30-15:50 Wolfgang Lang Ion-beam modification of cuprate superconductors on a sub-µm scale 7C-2  
15:50-16:10 Stephen Thoms Tilt-corrected stitching for electron beam lithography 7C-3  
16:10-16:30 Yogesh Karade Controlled sub-Micrometer Surface Morphologies by Thermal Relaxation of Locally Crosslinked Stretched Polymers Samples 7C-4  
16:30-16:50 Liam O'Faolain The effects of Lithography on Losses in Photonic Crystals 7C-5  
16:50-17:10 Sumio Hosaka Nano-dot arrays with a bit pitch and a track pitch of 25 nm 7C-6