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Last Updated:
15 June, 2006
Micro- and Nano-Engineering (MNE) is an international conference on micro- and nanofabrication using lithography and related techniques. The conference brings together engineers and scientists from all over the world to discuss recent progress and future trends in the fabrication and applications of micro- and nanostructures. On average the MNE conference has 300-400 participants. The conference proceedings are published in Microelectronic Engineering (Elsevier).
The MNE 2006 conference in Barcelona will be the 32nd in a series that started in Cambridge in 1975, most recently held in Cambridge (2003), Rotterdam (2004) and Vienna (2005).
MNE has a sister conference, the Electron-, Ion, and Photon-Beam and Nanotechnology Conference (EIPBN) in the USA and the Microprocesses and Nanotechnology Conference (MNC) in Japan. It is a tradition that the author of the "Best Paper" of at least one of the sister conferences is giving an invited talk at MNE.
The MNE conference starts with a welcome reception on Sunday, September 17 in the evening. The technical program starts on Monday, September 18 and ends on Wednesday, September 20 in the afternoon.
The program will feature plenary and invited presentations by a number of internationally recognized authors, contributed oral and poster presentations, and a commercial exhibition. In the last edition of MNE'05 in Vienna, the total number of presentations was 374. Oral and poster presentations are reviewed by the International Program Committee, which also selects the plenary and invited talks.
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Conference: |
17-20 september, 2006 |
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Abstract Submission:
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CLOSED
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Abstract Acceptance: |
21 July, 2006 |
Low rate registration: |
11 August, 2006 |
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Manuscript Submission:
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29 September, 2006
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